Research Summaries

Back Non-Linear Multivariable Run-To-Run Control of Photolithography

Fiscal Year 2007
Division Graduate School of Engineering & Applied Science
Department Applied Mathematics
Investigator(s) Kang, Wei
Sponsor Intel Corporation (Other)
Summary The goal of the proposed research is to design CD control methodology based on nonlinear models to regulate the lithography process with multiple parameters in a run-to-run control system in order to achieve the desired CD, to maintain the CD stability and uniformity, and to reduce or minimize the influence of unknown disturbances on the performance of the system.
Keywords
Publications Publications, theses (not shown) and data repositories will be added to the portal record when information is available in FAIRS and brought back to the portal
Data Publications, theses (not shown) and data repositories will be added to the portal record when information is available in FAIRS and brought back to the portal