Fiscal Year	2007
Division	Graduate School of Engineering & Applied Science
Department	Applied Mathematics
Investigator(s)	Kang, Wei
Sponsor	Intel Corporation (Other)
Summary	The goal of the proposed research is to design CD control methodology based on nonlinear models to regulate the lithography process with multiple parameters in a run-to-run control system in order to achieve the desired CD, to maintain the CD stability and uniformity, and to reduce or minimize the influence of unknown disturbances on the performance of the system.
Keywords
Publications	Publications, theses (not shown) and data repositories will be added to the portal record when information is available in FAIRS and brought back to the portal
Data	Publications, theses (not shown) and data repositories will be added to the portal record when information is available in FAIRS and brought back to the portal